Alibis : Sigmar Polke 1963-2010 / edited by Kathy Halbreich ; with Mark Godfrey, Lanka Tattersall, and Magnus Schaefer.

Catalog of an exhibition held at the Museum of Modern Art, New York, April 19-August 3, 2014, the Tate Modern, London, England, October 1, 2014-February 8, 2015, and at the Museum Ludwig, Cologne, Germany, March 14-July 5, 2015.

"Published to accompany the first comprehensive retrospective of Polke's work, organized by The Museum of Modern Art, New York, with Tate Modern, London, and begun with the artist before his death, in 2010"--Accompanying sheet.

Includes bibliographical references (page 301-309) and index.

Foreword / Glenn D. Lowry, Chris Dercon -- Acknowledgments / Kathy Halbreich -- Polke in context: a chronology / Kathrin Rottmann -- Alibis: an introduction / Kathy Halbreich -- Eight days a week / Lanka Tattersall -- From Moderne Kunst to Entartete Kunst: Polke and abstraction / Mark Godfrey -- Between practice and product: Polke's films / Barbara Engelbach -- For hire: Polke's Girlfriends / Christophe Cherix -- Higher beings send peas / Tacita Dean -- Impure lineage: Cardboardology / Christian Rattemeyer -- Polke's particles / Rachel Jans -- Photographing in a painterly way: Polke's Bowery photographs / Stefan Gronert -- Bad dad / Jutta Koether -- c. 1976 / an interview with Benjamin Buchloh -- Partial view: Sigmar Polke's reception in the United States in the 1980s / Magnus Schaefer -- Sloppy in detail / Matthias Muhling -- Making history: Watchtower II and photography / Marcelle Polednik -- Hallucination machines / John Kelsey -- Polke's patterns / Christine Mehring -- Sins and precious stones: Polke's windows at Grossmunster / Paul Chan -- Selected bibliography, 1997-2013 / Erhard Klein.

"Containing over 500 illustrations and published in conjunction with the first comprehensive Polke retrospective (organized by MoMA with the Tate Modern), this catalogue examines the full range of [Sigmar Polke] exceptionally inventive oeuvre. Four essays trace its broad themes and twelve others focus on single works or motifs."--Publisher.